The following accessories are available for most of our plasma systems.
- Generator 13.56 MHz
In accordance with the EN 55011 standard, our 13.56 MHz generators are stabilised by quartz. Impedance adaptation is possible in constant, manual and automatic modes. Main application domains: activation, cleaning, etching, semiconductors (front end), semiconductors (back end), plasma polymerisation ▪ Generator 40 khz
Impedance adaptation is possible only in automatic mode; the power is available in two models. Main application domains: activation, cleaning, etching, semiconductors (back end), plasma polymerisation
▪ Generator 2.45 GHz (microwaves)
The power goes from 0 to 300 watts. The generator is equipped with a PC connection. Main application domains: activation, cleaning, etching, semiconductors (front end), semiconductors (back end), plasma polymerisation.
▪ Valve 2/2 channels for dispensing fluids
Valve for precise dispensing of monomers.
▪ Semi-automatic control
A detailed description of our different control models is available by clicking on the menu Plasma Systems / Controls / Semi-automatic control
▪ Automatic control
A detailed description of our different control models is available by clicking on the menu Plasma Systems / Controls / Automatic control
▪ Control by PC
A detailed description of our different control models is available by clicking on the menu Plasma Systems / Controls / Control by PC
▪ Contrôle par PCCE
Functions with the Windows CE operating system with a touch screen. A detailed description of our different control models is available by clicking on the menu Plasma Systems / Controls / Control by PCCE
▪ Active carbon filter
The active carbon filter can be changed easily.
▪ Vacuum pump aspiration filter
Protects the vacuum pump from elements in suspension in the air, coating particles and impurities.
▪ Automatic door
This door closes automatically when the process starts.
▪ Barcode reader
For monitoring batches
▪ Heatable chamber
This chamber can be heated up to about 80°C. The temperature is adjustable. This chamber is suitable for processes which are carried out under precise conditions and for high rates of etchings.
▪ Measurement of induced voltage
This induced voltage measuring appliance is available for frequency generators in kHz and MHz.
The washing flask forms part of the accessories that are necessary for polymerisation, to connect the liquid monomers to the vacuum chamber. We use a carrier gas instead of a simple flask of monomers. The carrier gas, such as argon, is rinsed by the monomer.
▪ Butterfly valve
In vacuum technology, a butterfly valve serves to regulate a gaseous flow, mainly in controlling the aspiration of a vacuum pump. The resistance to flow in the pipe can be modified by adjusting a valve that more or less obstructs the pipe.
▪ Documentation in the local language
This documentation is produced in accordance with the machines directive is 89/392/EWG. Documentation in the local language, except for the English and German languages, is not automatically delivered with the installation. It must be ordered separately.
Type of support for the bulk treatment of parts.
Pirani or Baratron sensor: displays the pressure in the vacuum chamber.
▪ Pressure reducer
The pressure reducer enables connection to the gas bottle: 200 bars. Different pressure reducers are necessary for different gases. There are therefore pressure reducers for the noble gases, for H2, O2, CF4, C4F8 and for NH3.
▪ Continuous installations
To integrate a low-pressure plasma installation in an automatic treatment line.
▪ Set of standard spare parts or PFPE
The set of standard spare parts contains 1 tightening ring, 1 seal, 1 steel hose (for the vacuum pump), 1 window, 1 door seal, 10 micro-fuses for the plasma installation, 1 litre of mineral oil (standard set) or PFPE oil (PFPE set) for the vacuum pump
▪ Label printer
Automatic printing of labels after plasma treatment.
▪ Label reader
For monitoring batches.
▪ Faraday cage
For sensitive electrical components. The components to be treated are placed in the Faraday cage. This can be withdrawn from the vacuum chamber.
▪ Support for gas bottles
Fastens to the desk, shelves or bases. The length is 70 mm. The strap enables the support to be fixed soundly. This support is suitable for all dimensions of flasks.
▪ Gas detector (Dräger)
Additional security in case of the use of flammable gases on work sites.
The parts to be treated are placed on the hotplate. This can reach a maximum temperature of 150°C and is suitable for processes which are carried out under precise conditions and for high rates of etchings. Two options are available: A thermal sensor equipped with a temperature display is introduced into the vacuum chamber to measure the temperature on the surface of the element. A thermal sensor equipped with an integrated temperature display controlled by PC is also introduced into the vacuum chamber to measure the temperature at the surface of the element. The temperature is then displayed on the screen.
▪ Installation of your plasma installation on site
This option includes the transport time, the work time and the transport expenses of our employees.
▪ Ion flow measurement sensor
Additional quality control of plasma during the process.
▪ Corrosive gas model
Steel valves. Steel pipes. Mandatory for plasma polymerisation or the use of corrosive gases such as NH3, H2O, CF4 or SF6.
▪ Customer-specific supports
Our installations are always delivered with a support. Other models may be produced upon request from Diener electronic. Enabling optimum use of the plasma installation.
▪ Spray varnish / glass plates kit (to test that materials are silicone-free)
Accessories for the silicone absence test. Content of the delivery: varnish spray, 5 flasks of 400 mL. 100 glass plates 90 mm x 110 mm.
▪ Slow aeration of the vacuum chamber
The vacuum chamber is aerated slowly using a filter. Thus, the small particles do not circulate in the chamber.
▪ Slow pumping of the vacuum chamber
The vacuum chamber is slowly pumped using a bypass valve. Thus, the small particles do not circulate in the chamber.
▪ Longer vacuum chambers (Femto, Pico, Nano…)
In accordance with the standard DIN 12198, a measure of the intensity of UV radiation was performed on our installations (gauge). Result: no risk. These vacuum chambers are deliverable in steel, borosilicate glass or quartz glass. It is possible to choose a door closure by lid or by door with hinge. The length of the vacuum chambers depends upon the plasma application and your requirements. Do not hesitate to contact us.
▪ Display of the power
Display of the power of the generator. Analogue display instrument.
▪ Multi-stage electrode
The multi-stage electrode is available for circular and/or rectangular vacuum chambers. Several parts can be treated at the same time. The application domain is mainly standard plasma processes. Do not hesitate to contact Diener electronic if you have any questions on the exact structure of your electrode and on other materials for preparing your support.
▪ Microwave leak detector
Given that the radiation is dangerous, it may be useful to add a microwave leak detector to microwave installations.
▪ Monomers flask
Polymerisation accessory. To connect liquid monomers to the vacuum chamber.
▪ Network connection
Enables the installation to be connected to a computer.
▪ Optical Emission Spectrometer (OES)
Monitoring the plasma process for quality assurance. Detection of the extremity of the plasma process. May be connected only to an installation controlled by PC.
▪ Polymerisation accessories
Contains an evaporator flask, a weighing machine, a dispensing pump, a heating device and possibly a hook.
▪ Process gas bottle
Oxygen bottle for connection as process gas in 2, 5 and 10 litre models, hydrogen bottle of 2 litres, argon bottle of 5 litres. Specific transport conditions must be planned for gas deliveries. For rented installations, the bottles must be purchased.
▪ Vat made of quartz glass
Available in two sizes. For a plasma process or treatment of extremely clean plates.
▪ RIE electrode
Available as a circular and rectangular model made of steel, produces high rates of etching. Application domains: anisotropic and isotropic etching.
▪ RIE electrode in shower head configuration
Rectangular, made of steel. Produces etching rates through homogeneous distribution of gases. Application domain: anisotropic etching.
▪ Coils system
For the treatment of plastic films / lead frames, for example.
▪ Oxygen generator
The oxygen is generated from the ambient air. Type Kröber O2. Oxygen power: 3-6 l/min.
▪ Safety valve
For the use of flammable gases, such as hydrogen, ethyne, etc.
▪ Electrode and special support
Do not hesitate to contact Diener electronic if you have any questions on the exact structure of your electrode and on other materials for preparing your support.
▪ Additional clamps
The additional clamps are used when additional connections are necessary.
▪ Special vacuum chambers
In accordance with the standard DIN 12198, a measure of the intensity of UV radiation was performed on our installations (gauge). Result: no risk. There are special circular vacuum chamber models with lids or rectangular models with doors and hinges. They are made of aluminium and are also differentiated by the diameter of their openings and by their internal dimensions. Do not hesitate to contact us.
▪ Standard circular or rectangular electrode
Made of steel/aluminium sheet metal for the standard plasma process.
▪ Support for TEM samples
Special device to be introduced into the chamber from the exterior. All dimensions can be produced. Just inform us of the measurements/designs of your parts.
▪ Temperature display appliance
Display of the temperature in the chamber without hotplate. A heat sensor is introduced into the vacuum chamber. The temperature at the surface of the element can therefore be measured. The display of the temperature can also be integrated into the control by PC. The temperature is then displayed on the screen.
▪ Test inks kit
Test inks for easy analysis of surface tension. 28, 38, 56, 64, 72 and 105 mN/m in one kit. Other values are available on request.
▪ Thermal evaporator
For substances of low vapour pressure. Diameter of the drum: 16 mm, Volume of the drum: 0.1 L. Protection against plasma effects, control of the temperature (500°C max) and of the speed of temperature increase (up to 250 °C/min). The connection is via small flanges.
▪ Process timer LT4H
Replaces the standard timer for adjusting process times.
▪ Glass vacuum chambers (borosilicate or quartz)
The borosilicate glass vacuum chambers are suitable for clean plasma processes, and the quartz glass chambers for ultra clean processes.
▪ Steel vacuum chambers
The steel vacuum chambers are suitable for standard plasma processes.
▪ Vacuum units
Vane pump or dry-sealed vacuum pump with mineral oil or PFPE. The pumps are delivered filled with oil.
▪ Special device for powder treatment
The powder is treated in a rotary gas bottle. For filling, the bottle can be removed from the installation.
▪ Water cooling system
Air/water cooling on casters for mobile use. Connection without potential for 2 changeover contacts for the pump protection device.
▪ Maintenance offer for your plasma installation
The maintenance offer from Diener electronic includes complete servicing: draining the oil, checking all the connections, joints, connectors, etc., leak detection test, balancing the pressure sensor and functioning test. For more information on servicing and maintenance services, click on the Consulting menu.
▪ Washing powder bag
To pre-wash small parts in the washing machine. Dimensions: 500 mm x 300 mm. Minimum order quantity: 20 items.
▪ Drying machine
For pre-washing small parts before plasma treatment. Necessary only for very dirty parts. Manufacturer: Miele: Model WT 2670 WPM.
▪ Water cooled support platform
The water cooled platform is fitted on the floor of the chamber and is delivered with the hydraulic pump and water tank. It can cool parts that are sensitive to heat.
▪ Other software functions
You can add new options to your software at any time. Do not hesitate to inform us of your requirements.
▪ New gas pipes
Needle valve: our installations can be fitted with as many needle valves as you would like. Traditionally, it is possible to install 1 to 3 valves on a plasma installation of the Femto type according to requirements.
▪ Additional MFC
Gas mass flow controllers are necessary for systems controlled by PC and by PCCE. Our installations may be equipped with as many gas mass flow controllers (MFC) as you would like.
The options can mostly be installed after the system has been put into production.
For all technical questions, please contact us.