Etching

Technique during which an oxide or a film is removed from the surface. Engraving may be done by soaking the part in an acid or alkaline solution or by plasma treatment (“plasma etching”), using the appropriate gas. Example: to engrave silicon, in microelectronics, we use SIO2 or SI4N3. Using this process, we can de-oxidise metals and modify the surfaces of non-adherent polymers, such as PTFE.