CVD

Chemical deposit in the vapour phase, technique for depositing a layer by decomposition of a material in gaseous form (example: deposit of a metallic layer by thermal evaporation of the metal to be deposited). The CVD technique can be optimised by a plasma reaction (PECVD = Plasma Enhanced CVD / PACVD = Plasma Activated CVD). The main applications of deposit in the vapour phase are the coating of parts with amorphous layers of the carbon, silicon or titanium or the cabide and nitride types.